JP6800296B2 - How to operate the optical tracking system and the optical tracking system - Google Patents

Description

The present invention relates to an optical tracking system and a tracking method using the same, and more specifically, tracks the coordinates of a marker attached to an object such as an affected area or a surgical tool to detect the spatial position and direction of the object. It relates to an optical tracking system to be operated and a tracking method using the optical tracking system.

Recently, robotic surgery is being promoted in order to further reduce the pain of patients and enable them to recover quickly when performing laparoscopic surgery or otolaryngology surgery.

During such robotic surgery, the spatial position and orientation of objects such as affected areas and surgical tools were accurately tracked and detected in order to minimize the risk of surgery and enable more precise surgery. Later, a navigation is used that allows the surgical tool to be accurately steered to the affected area of the patient (NAVIGATE).

Surgical navigation as described above includes a tracking system capable of accurately tracking and detecting the spatial position and orientation of an object such as an affected area or surgical instrument as described above.

Tracking systems such as those described above typically include a marker attached to an object such as an affected area or surgical instrument, first and second imaging units that image the light emitted by the marker, and the first and second imaging units. After calculating the three-dimensional coordinates of the marker connected to the second imaging unit, the information of the straight line connecting the markers adjacent to each other and the angle information formed by the pair of straight lines adjacent to each other are obtained from the marker. It includes a processor that calculates the spatial position and direction of the object in comparison with three-dimensional coordinates.

Conventional general tracking systems such as those described above use the circular diameter of the marker imaged on the imaging unit to measure the distance separated from the marker through the processor. However, since the circular frame of the marker imaged on the imaging unit is opaque due to the distortion of the imaging unit lens, there is a problem that it is difficult to accurately measure the circular diameter of the marker. Not only that, there is a problem that the change in the circular diameter of the marker according to the change in distance is very small, the distinguishing power between the marker and the distance is very low, and the position of the marker cannot be measured accurately. It was.

Therefore, an object of the present invention is to provide an optical tracking system capable of detecting and tracking an accurate spatial position and direction of an object regardless of the distance of the object to be measured, and a tracking method using the same. is there.

The optical tracking system according to an embodiment of the present invention emits parallel emission light of the pattern portion so that the image of the pattern portion contained inside the object can be enlarged and imaged. The at least one marker unit, the at least one imaging unit that receives the parallel emission light of the pattern portion emitted from the marker unit and forms an image of the enlarged pattern portion, and the imaging unit. It includes a processor that calculates the spatial position and direction of the marker unit using an image of a pattern portion that has been imaged and enlarged.

According to one embodiment, the marker unit has at least one pattern portion in which a large number of patterns are formed, at least one light source that irradiates the pattern portion with light, and is irradiated from the light source and passes through the pattern portion. It can also include at least one first lens unit that emits light reflected by the pattern unit to the imaging unit in the form of parallel emission light.

Here, it is desirable that the pattern portion is arranged at the focal length of the first lens portion.

On the other hand, the first lens unit can be an objective lens.

According to one embodiment, the light source may be located inside the marker unit.

According to other examples, the light source may be located outside the marker unit.

Here, the light source may be an LED (Light Emitting Diode).

According to one embodiment, the imaging unit receives the parallel emission light of the pattern portion emitted from the marker unit through the lens unit, and receives an image of the pattern portion enlarged by the parallel emission light as a sensor unit. It can be a camera that forms an image on the lens.

On the other hand, the processor calculates the spatial position of the marker unit by using the change in the position and size of the image of the pattern portion imaged and enlarged on the imaging unit, and the enlarged pattern portion. The direction of the marker unit can be calculated by using the pattern position for each area and the change in the size of the pattern.

According to one embodiment, the processor compares the position and size of the image of the pattern portion imaged and magnified by the imaging unit with the reference position and size of the already stored reference pattern portion image. The spatial position of the marker unit can be calculated, and the position and pattern size of the area-specific pattern of the enlarged pattern portion and the position and reference pattern of the area-specific reference pattern of the already stored pattern unit image can be calculated. The direction of the marker unit can be calculated by comparing with the size.

On the other hand, the marker unit can also reflect the light emitted from at least one light source through a ball lens provided with a pattern portion on the surface and emit it in the form of parallel emission light. Here, the pattern portion can be provided on the entire surface or a part of the surface of the ball lens.

According to another embodiment, the marker unit can be irradiated from at least one light source, and light reflected by the pattern portion or transmitted through the pattern portion can be passed through the fisheye lens and emitted in the form of parallel emission light. ..

The pattern portion may be arranged at the focal length of the fisheye lens.

Alternatively, the light source may be arranged outside the marker unit so that light is reflected by the pattern portion and can pass through the fisheye lens. Unlike this, the light source may be arranged inside the marker unit so that the light emitted from the light source can pass through the pattern portion and pass through the fisheye lens.

According to another embodiment, after the marker unit is irradiated from at least one light source and reflected by the pattern portion or passed through the pattern portion and passed through the objective lens to be emitted in the form of parallel emission light. , Parallel emission light with different angles of view can be emitted through the prism.

The pattern portion may be arranged at the focal length of the objective lens.

Alternatively, the light source may be arranged outside the marker unit so that light is reflected by the pattern portion and can pass through the objective lens. Unlike this, the light source may be arranged inside the marker unit so that the light emitted from the light source can pass through the pattern portion and pass through the objective lens.

According to another embodiment, the marker unit can reflect the light emitted from at least one light source through the mirror portion provided with the pattern portion and emit it in the form of parallel emission light.

The marker unit is arranged so as to be isolated from the mirror portion for a certain period of time so that the light reflected by the mirror portion and emitted in the parallel light form can be converted into the parallel emission light form again and emitted. The first lens made can be further included.

Alternatively, the marker unit may adjust the amount of light incident on the mirror unit so that the angle of view and resolution of the image of the enlarged pattern unit imaged on the imaging unit can be adjusted. The aperture provided can be further included.

On the other hand, the mirror portion may be a spherical or aspherical mirror.

Subsequently, in the tracking method using the optical tracking system according to the embodiment of the present invention, the marker unit attached to the target object can be attached to the pattern portion so that the image of the pattern portion can be enlarged and imaged. A step of emitting parallel emission light, a step of receiving the parallel emission light of the pattern portion emitted from the marker unit by the imaging unit and forming an image of the enlarged pattern portion, and a step of forming an image on the imaging unit. It includes a step of calculating the spatial position and direction of the marker unit through a processor using an image of a pattern portion that has been imaged and enlarged.

According to one embodiment, in the step of calculating the spatial position and direction of the marker unit, the marker unit was rotated using an image of a pattern portion imaged and enlarged on the imaging unit through the processor. The marker unit is calculated using the steps of calculating the angle and calculating the direction of the marker unit, the image of the pattern portion imaged and enlarged on the imaging unit through the processor, and the rotated angle of the marker unit. Can include a step of calculating the spatial position of.

Here, in the step of calculating the direction of the marker unit, the change in the position of the pattern and the size of the pattern portion for each region of the image of the pattern portion imaged and enlarged on the imaging unit through the processor is measured. Steps to be performed, the position of the reference pattern portion by region and the size of the reference pattern portion of the pattern portion image already stored in the processor, and the region of the image of the pattern portion imaged and enlarged by the imaging unit. It can include a step of comparing the position of the pattern portion and the change in the size of the pattern portion and calculating the rotated angle of the marker unit.

Then, the step of calculating the spatial position of the marker unit is the step of measuring the position and size of the image of the pattern portion imaged and enlarged on the imaging unit through the processor, and the step already stored in the processor. A step of calculating the spatial position of the marker unit by comparing the reference position and size of the image of the pattern portion with the position and size of the image of the pattern portion imaged and enlarged by the imaging unit through the processor. Can include.

According to one embodiment, the marker unit can reflect light emitted from at least one light source through a ball lens provided with a pattern portion on the surface and emit it in the form of parallel emission light.

According to another embodiment, the marker unit can emit light in the form of parallel emission light, which is irradiated from at least one light source and reflected by the pattern portion or passed through the pattern portion through a fisheye lens. ..

According to another embodiment, after the marker unit is irradiated from at least one light source and reflected by the pattern portion or passed through the pattern portion and passed through the objective lens to be emitted in the form of parallel emission light. , Parallel emission light with different angles of view can be emitted through the prism.

According to another embodiment, the marker unit can reflect the light emitted from at least one light source through the mirror portion provided with the pattern portion and emit it in the form of parallel emission light.

As described above, in the optical tracking system according to the embodiment of the present invention and the tracking method using the same, the parallel emission light of the pattern portion is emitted from the marker unit to form an image of the enlarged pattern portion on the imaging unit. After that, the spatial position of the marker unit is calculated using this. That is, the position accuracy of the marker unit does not depend only on the resolving power of the imaging unit, and the distance of the target object to be measured is measured by enlarging the image of the pattern portion and forming an image on the imaging unit. The spatial position and direction of the target object can be calculated without a decrease in accuracy even if the object is far away.

Therefore, the optical tracking system according to the embodiment of the present invention and the tracking method using the same can detect and track the accurate spatial position and direction of the target object regardless of the distance of the target object to be measured. Not only can the area be greatly expanded, but the size of the marker unit can be significantly reduced compared to conventional markers, so there is the effect that the equipment can be miniaturized.

It is the schematic of the tracking system according to 1st Example of this invention. It is a drawing which showed an example of the pattern part of a marker unit. It is a flowchart for demonstrating the process of tracking an object using the optical tracking system according to 1st Embodiment of this invention. It is a drawing for demonstrating the process which light is emitted from a marker unit. It is a drawing for demonstrating the process in which a parallel emission light is incident on an imaging unit. It is a drawing for demonstrating the process of calculating the direction of an object using the optical tracking system according to 1st Example of this invention. It is a drawing for demonstrating the process of calculating the spatial position of an object using the optical tracking system according to 1st Embodiment of this invention. It is a drawing for demonstrating the process of calculating the spatial position of an object using the optical tracking system according to 1st Embodiment of this invention. It is a drawing for demonstrating the process of calculating the spatial position of an object using the optical tracking system according to 1st Embodiment of this invention. It is a drawing for demonstrating the process of calculating the spatial position of an object using the optical tracking system according to 1st Embodiment of this invention. It is a flowchart for demonstrating the process of calculating the spatial position and direction of a marker unit. It is a flowchart for demonstrating the process of calculating the direction of a marker unit. It is a flowchart for demonstrating the process of calculating the spatial position of a marker unit. It is the schematic of the optical tracking system according to 2nd Example of this invention. It is a drawing for demonstrating the process of calculating the spatial position of a marker unit by 2nd Embodiment of this invention. It is the schematic of the optical tracking system according to the 3rd Example of this invention. It is a drawing for demonstrating the process of calculating the spatial position of a marker unit by the processor of the optical tracking system according to 3rd Embodiment of this invention. It is the schematic of the optical tracking system according to 4th Example of this invention. It is a drawing for demonstrating the process of calculating the spatial position of a marker unit by the processor of the optical tracking system according to 4th Embodiment of this invention. It is the schematic of the optical tracking system according to 5th Example of this invention. It is a drawing which showed the marker unit according to 5th Example of this invention. It is a flowchart for demonstrating the process of tracking an object using the optical tracking system according to 5th Embodiment of this invention. It is a flowchart for demonstrating the process of calculating the spatial position and direction of a marker unit. It is a flowchart for demonstrating the process of calculating the direction of a marker unit. It is a drawing for demonstrating the process of calculating the direction of an object using the optical tracking system according to 5th Example of this invention. It is a flowchart for demonstrating the process of calculating the spatial position of a marker unit. It is a drawing for demonstrating the process of calculating the spatial position of a marker unit. It is a drawing for demonstrating the process of calculating the spatial position of a marker unit. It is a drawing for demonstrating the process of calculating the spatial position of a marker unit. It is a drawing for demonstrating the process of calculating the spatial position of a marker unit. It is the schematic of the optical tracking system according to the 6th Example of this invention. It is the schematic of the optical tracking system according to 7th Example of this invention. It is the schematic of the optical tracking system according to 8th Example of this invention. It is a drawing for demonstrating the marker unit according to the 9th Example of this invention. It is a drawing for demonstrating the marker unit according to the tenth embodiment of this invention. It is the schematic of the optical tracking system according to 11th Example of this invention. It is a drawing which showed the marker unit according to the eleventh embodiment of this invention. It is a flowchart for demonstrating the process of tracking an object using the optical tracking system according to 11th Embodiment of this invention. It is a flowchart for demonstrating the process of calculating the spatial position and direction of a marker unit. It is a flowchart for demonstrating the process of calculating the direction of a marker unit. It is a drawing for demonstrating the process of calculating the direction of an object using the optical tracking system according to 11th Example of this invention. It is a flowchart for demonstrating the process of calculating the spatial position of a marker unit. It is a drawing for demonstrating the process of calculating the spatial position of a marker unit. It is a drawing for demonstrating the process of calculating the spatial position of a marker unit. It is a drawing for demonstrating the process of calculating the spatial position of a marker unit. It is a drawing for demonstrating the process of calculating the spatial position of a marker unit.

Specific description of the invention

The present invention can be modified in various ways and can have various forms, and a specific embodiment will be illustrated in the drawings and described in detail in the text. However, this is not intended to limit the invention to any particular form of disclosure, but should be understood to include all modifications, equivalents or alternatives contained within the ideas and technical scope of the invention.

The terms first, second, etc. are used to describe various components, but the components should not be limited by the terms. The term is used only to distinguish one component from the other. For example, the first component can be referred to as the second component without departing from the scope of rights of the present invention, and similarly the second component can be referred to as the first component.

The terms used in this application are used solely to describe a particular embodiment and are not intended to limit the invention. A singular expression includes multiple expressions unless they have distinctly different meanings in the context. In this application, terms such as "including" or "having" specify the existence of features, numbers, steps, actions, components, components or combinations thereof described herein. It should be understood that it does not preclude the possibility of existence or addition of one or more other features or numbers, steps, actions, components, components or combinations thereof.

Unless defined differently, all terms used herein, including those that are technical or scientific, are the same as those commonly understood by those with ordinary knowledge in the technical field to which the present invention belongs. Has the meaning of.

Terms and the like defined in commonly used dictionaries should be construed to have a meaning consistent with the contextual meaning of the relevant technology, which is ideal or excessive unless explicitly defined in this application. Not interpreted in a formal sense.

Hereinafter, desirable embodiments of the present invention will be described in more detail with reference to the drawings.

In the optical tracking system according to the embodiment of the present invention and the tracking method using the same, after attaching at least one marker unit to an object such as an affected area or a surgical tool, the parallel emission light emitted from the marker unit is emitted. After receiving light through the imaging unit to form an enlarged image of the pattern portion included in the marker unit, the spatial position and direction of the target object can be calculated through the processor using the enlarged image of the pattern portion. The detailed configuration thereof will be described with reference to the drawings.

<Example 1>
FIG. 1 is a schematic view of a tracking system according to a first embodiment of the present invention, and FIG. 2 is a drawing showing an example of a pattern portion of a marker unit.

Referring to FIGS. 1 and 2, the tracking system according to the first embodiment of the present invention includes a marker unit 110, an imaging unit 120 and a processor 130.

The marker unit 110 emits parallel emission light of the pattern portion 111 so that the image of the pattern portion 111 included in the target object can be enlarged and imaged.

For example, the marker unit 110 can include a pattern unit 111, a light source 112, and a first lens unit 113.

In the pattern portion 111, a plurality of pattern portions 111a are formed in a constant form and at intervals. For example, the pattern portion 111 can be manufactured so that the remaining portion excluding the portion where the pattern portion 111a is formed can transmit light. As another example, the pattern portion 111 may be manufactured so that light can be transmitted only to a portion where the pattern portion 111a is formed, and the remaining portion cannot transmit light. Further, to give another example, the pattern portion 111 can be manufactured so that the light emitted from the light source 112 can be reflected. Here, the pattern unit 111 may be arranged at the focal length of the first lens unit 113, which will be described later.

The light source 112 irradiates the pattern portion 111 with light. For example, the light source 112 may be arranged inside the marker unit 110 so as to be located behind the pattern portion 111. As described above, when the light source 112 is arranged behind the pattern unit 111, a part of the light emitted from the light source 112 is transmitted through the pattern unit 111, and the imaging unit described later is transmitted. It is incident on 120. As another example, the light source 112 may be arranged outside the marker unit 110. When the light source 112 is arranged outside the marker unit 110, the light emitted from the light source 112 is reflected by the pattern unit 111 and incident on the imaging unit 120 described later. Here, the light source 112 may be an LED (Light Emitting Diode).

The first lens unit 113 is irradiated from the light source 112 and passes through the pattern unit 111, or the light reflected by the pattern unit 111 is emitted to the imaging unit 120 in the form of parallel emission light and incident. It is arranged in front of the pattern portion 111 so as to obtain it. For example, the first lens unit 113 may be an objective lens that enlarges the image of the pattern unit 111 so that the imaging unit 120 can form an image.

The imaging unit 120 can receive an image of the enlarged pattern unit 111 by receiving the parallel emission light of the pattern unit 111 emitted from the marker unit 110. Here, the imaging unit 120 receives the parallel emission light of the pattern unit 111 emitted from the marker unit 110 through the lens unit 121, and receives an image of the pattern unit 111 magnified by the parallel emission light as a sensor unit. It can be a camera that forms an image on 122.

The processor 130 can calculate the spatial position and direction of the marker unit 110 by using the image of the pattern unit 111 which is connected to the imaging unit 120 and imaged on the imaging unit 120 and enlarged. .. Here, the processor 130 can calculate the spatial position of the marker unit 110 by using the change in the position and size of the image of the pattern unit 111 imaged and enlarged by the imaging unit 120. Further, the processor 130 can calculate the direction of the marker unit 110 by using the position of the area-specific pattern portion of the enlarged pattern portion 111 and the change in the size of the pattern portion 111a.

The process of calculating the spatial position and direction of the target object by using the optical tracking system according to the first embodiment of the present invention will be described with reference to FIGS. 1 to 7d.

FIG. 3 is a flowchart for explaining a process of tracking an object by using the optical tracking system according to the first embodiment of the present invention, and FIG. 4 is a drawing for explaining a process of emitting light from a marker unit. FIG. 5 is a drawing for explaining a process in which parallel emission light is incident on the imaging unit, and FIG. 6 is a drawing for calculating the direction of the target object using the optical tracking system according to the first embodiment of the present invention. 7a to 7d are drawings for explaining the process of calculating the spatial position of the target object by using the optical tracking system according to the first embodiment of the present invention. FIG. 8 is a flowchart for explaining the process of calculating the spatial position and the direction of the marker unit, FIG. 9 is a flowchart for explaining the process of calculating the direction of the marker unit, and FIG. 10 is a flowchart for explaining the process of calculating the direction of the marker unit. It is a flowchart for demonstrating the process of calculating the spatial position of a marker unit.

With reference to FIGS. 1 to 7d, in order to track an object using the optical tracking system according to the first embodiment of the present invention, the image of the pattern portion 111 can be enlarged and imaged. , The parallel emission light of the pattern portion 111 is emitted from the marker unit 110 attached to the target object (S110).

The process of emitting the parallel emission light of the pattern unit 111 will be described in more detail. First, the light source 112 is operated to irradiate the pattern unit 111 with light, and the light emitted from the light source 112 is transmitted through the pattern unit 111. Or make it reflected by the pattern unit 111. As shown in FIG. 4, the light transmitted through the pattern unit 111 or reflected by the pattern unit 111 passes through the first lens unit 113 made of an objective lens and is emitted in the form of parallel emission light.

The parallel emission light of the pattern unit 111 emitted from the marker unit 110 through the first lens unit 113 is incident on the imaging unit 120 to form an enlarged image of the pattern unit 111 (S120).

The process of forming an image of the enlarged pattern unit 111 will be described in more detail. FIG. 5 shows the parallel emission light of the pattern unit 111 emitted from the marker unit 110 through the first lens unit 113. As shown, it passes through the lens unit 121 of the imaging unit 120. The parallel emission light of the pattern unit 111 that has passed through the lens unit 121 of the imaging unit 120 causes the sensor unit 122 to form an image of the enlarged pattern unit 111.

As described above, when the image of the enlarged pattern unit 111 is formed on the imaging unit 120, the processor 130 uses the image of the enlarged pattern unit 111 to form the spatial position and direction of the marker unit 110. Is calculated (S130).

The process of calculating the spatial position and direction of the marker unit 110 with reference to FIG. 8 will be described in more detail as follows.

FIG. 8 is a flowchart for explaining a process of calculating the spatial position and direction of the marker unit.

Referring to FIG. 8, in order to calculate the spatial position and direction of the marker unit 110 through the processor 130, an image of the pattern portion 111 imaged and enlarged by the imaging unit 120 through the processor 130 is used. The angle at which the marker unit 110 is rotated is calculated, and the direction of the marker unit 110 is calculated (S131).

When the rotated angle of the marker unit 110 is calculated by the processor 130 as described above, the image of the pattern portion 111 imaged and enlarged on the imaging unit 120 through the processor 130 and the marker unit 110 The spatial position of the marker unit 110 is calculated using the rotated angle (S132).

Here, the spatial position and direction information of the imaging unit 120 is already stored in the processor 130.

The step (S131) for calculating the direction of the marker unit 110 with reference to FIGS. 6 and 9 will be described in more detail as follows.

FIG. 9 is a flowchart for explaining a process of calculating the direction of the marker unit.

Referring to FIG. 9, in order to calculate the direction of the marker unit 110, first, the area-specific pattern unit 111a of the image of the pattern unit 111 imaged and enlarged on the imaging unit 120 through the processor 130. Changes in the position and the size of the pattern portion 111a are measured (S1310).

After measuring the change in the position of the area-specific pattern unit 111a of the image of the pattern unit 111 and the size of the pattern unit 111a, the area-specific reference pattern unit 111a of the image of the pattern unit 111 already stored in the processor 130. The size of the position and reference pattern portion 111a is compared with the change in the position of the pattern portion 111a for each region and the size of the pattern portion 111a of the image of the pattern portion 111 imaged and enlarged by the imaging unit 120. By calculating the rotated angle of the marker unit 110, the direction of the marker unit 110 is calculated (S1311).

That is, as shown in FIG. 6, when the marker unit 110 rotates, the position and size of the pattern portion 111a of the image I1 of the pattern portion 111 imaged and enlarged by the imaging unit 120 also change. The position of the region-specific reference pattern portion 111a of the pattern portion image I2 already stored in the processor 130, the size of the reference pattern portion 111a, and the region of the image I1 of the pattern portion imaged on the imaging unit 120. When the position of the separate pattern portion 111a and the change in the size of the pattern portion 111a are compared, the rotated angle of the marker unit 110 can be calculated, so that the direction of the marker unit 110 can be calculated. Will be able to.

Next, the step (S132) of calculating the spatial position of the marker unit with reference to FIGS. 7a to 7d and 10 will be described in more detail as follows.

FIG. 10 is a flowchart for explaining a process of calculating the spatial position of the marker unit.

Referring to FIG. 10, in order to calculate the spatial position of the marker unit 110, first, the position and size of the image of the pattern portion 111 imaged and enlarged on the imaging unit 120 are measured through the processor 130. (S1320).

After measuring the position and size of the image of the pattern unit 111, the reference position and size of the image of the pattern unit 111 already stored in the processor 130 and the image formed on the imaging unit 120 and enlarged. The position and size of the image of the pattern unit 111 are compared with each other through the processor 130, and the spatial position of the marker unit 110 is calculated (S1321).

FIG. 7a shows a reference position and size in which an image of the pattern unit 111 is imaged on the imaging unit 120 when the marker unit 110 is already stored in the processor 130. As shown in FIG. 7b, when the separated distance D2 between the marker unit 110 and the imaging unit 120 is shorter than the reference distance D1, the reference of the image of the pattern unit 111 already stored in the processor 130. The image size A2 of the image of the pattern unit 111, which is larger than the size A1, is further imaged on the imaging unit 120. Therefore, the reference size A1 of the image of the pattern unit 111 and the image size A2 of the image of the pattern unit 111 imaged and enlarged by the imaging unit 120 are compared through the processor (130), and the marker unit. It becomes possible to calculate the spatial position of 110.

On the other hand, although not shown in the drawing, when the separated distance D2 between the marker unit 110 and the imaging unit 120 is longer than the reference distance D1, the image of the pattern portion already stored in the processor 130 is displayed. The image size A2 of the enlarged pattern portion 111 is formed smaller than the reference size A1 on the imaging unit 120.

Then, as shown in FIG. 7c, when the marker unit 110 is located below the reference position B1, the reference position (C1: see FIG. 7a) of the image of the pattern unit 111 already stored in the processor 130. The enlarged image of the pattern portion 111 is located at the upper part and is imaged on the imaging unit 120. Therefore, the spatial position of the marker unit 110 is determined by comparing the reference position C1 of the image of the pattern unit 111 with the position C2 of the image of the pattern unit 111 imaged and enlarged by the imaging unit 120 through the processor 130. You will be able to calculate.

On the other hand, although not shown in the drawing, when the marker unit 110 is located on the reference position B1, the enlarged pattern portion is larger than the reference position C1 of the image of the pattern portion 111 already stored in the processor 130. The image of 111 is imaged on the imaging unit 120 so that it is located at the bottom.

Then, when the separated distance D2 between the marker unit 110 and the imaging unit 120 is different from the reference distance D1 and the marker unit 110 is not located at the reference position B1, it is already stored in the processor 130. The spatial position of the marker unit 110 is calculated by comparing the reference position C1 and the size A1 of the image of the pattern portion with the position C2 and the size A2 of the image imaged and enlarged on the imaging unit 120. be able to.

On the other hand, as shown in FIG. 7d, the separated distance D2 between the marker unit 110 and the imaging unit 120 is the same as the reference distance D1, and the marker unit 110 is located at the reference position B1. When only the direction of the marker unit 110 is changed by θ, the size A2 and the position C2 of the image of the enlarged pattern portion 111 imaged on the imaging unit 120 are already stored in the processor 130. It is calculated to be the same as the reference position C1 and the size A1 of the image of the pattern portion 111. Therefore, as described in step S1311, the direction of the marker unit 110 has already changed in the position of the area-specific pattern portion 111a of the image I1 of the enlarged pattern portion 111 and the size of the pattern portion 111a, and in the processor 130. The direction of the marker unit 110 is determined by calculating the rotated angle of the marker unit 110 by comparing the position of the region-specific reference pattern portion 111a of the stored pattern portion image I2 and the size of the reference pattern portion 111a. Can be calculated.

<Example 2>
The optical tracking system according to the present embodiment is substantially the same as the optical tracking system according to the first embodiment except that the two imaging units are arranged, and thus is related to the arrangement of the imaging units. Detailed explanations about other components and contents excluding the contents of the parts will be omitted.

FIG. 11 is a schematic view of an optical tracking system according to a second embodiment of the present invention.

Referring to FIG. 11, the optical tracking system according to this embodiment includes one marker unit 210, first and second imaging units 220a and 220b, and a processor 230.

The first and second imaging units 220a and 220b are arranged so as to be separated from each other by a certain angle about the marker unit 210, and receive parallel emission light of the pattern portion 211 emitted from the marker unit 210, respectively. Then, images of the enlarged pattern portions 211, which are different from each other, are formed. Here, it is desirable that the first and second imaging units 220a and 220b are arranged on the Y-axis as shown in FIG.

In the optical tracking system according to the present embodiment, the first and second imaging units 220a and 220b form an image of the two enlarged pattern portions 211, so that the processor 230 also obtains two spatial position coordinates of the marker unit 210. Since it can be calculated, the spatial position and direction of the marker unit 210 can be calculated more accurately than the optical tracking system according to the first embodiment.

The process of calculating the spatial position of the marker unit by the processor of the optical tracking system according to the present embodiment will be described with reference to FIGS. 11 and 12 with reference to FIGS. 11 and 12.

FIG. 12 is a drawing for explaining a process of calculating the spatial position of the marker unit according to the second embodiment of the present invention.

As shown in FIG. 12, assuming that the coordinates of the first lens unit 213 of the marker unit 210 are X and Y, the coordinates X and Y of the first lens unit 213 can be expressed as in Equation 1.

Here, fc is the X-axis coordinate of the image of the pattern portion 211 imaged and enlarged by the first and second imaging units 220a and 220b, and L is the lens portion 221b of the second imaging unit 220b. The Y-axis coordinates, u ₁ is the Y-axis coordinates of the center coordinates of the image of the pattern unit 211 imaged and enlarged on the first imaging unit 220a, and u ₂ is the Y-axis coordinates on the second imaging unit 220b. It is the Y-axis coordinate of the center coordinate of the image of the pattern part 211 which was imaged and enlarged.

As shown in FIG. 12, the position of the first lens portion 213 of the marker unit 210 is confirmed by the first and second imaging units 220a and 220b when there is a rotation value of only θ in the direction in a fixed state. The real space coordinates (X ₁ , Y ₁ ) (X ₂ , Y ₂ ) of the pattern portion 211 of the marker unit 210 can be expressed as in Equation 2.

Here, f _b is the focal length of the first lens unit 213 of the marker unit 210, and θ is the rotation value of the marker unit 210.

Then, the center coordinates of the enlarged pattern 211 image is focused on the first imaging unit 220a and _X 3, _{Y 3,} the enlarged pattern 211 is imaged on the second imaging unit 220b When the center coordinates of the image and X4, Y4, as shown in FIG. 12, the center coordinates of the enlarged pattern 211 image is imaged in the first imaging unit _{220a (X 3, Y 3)} , the The center coordinates (0, 0) of the lens unit 221a of the 1 imaging unit 220a, the center coordinates (X, Y) of the first lens 213 of the marker unit 210, and the marker unit 210 confirmed by the first imaging unit 220a. It can be confirmed that the real space coordinates (X ₁ , Y ₁ ) of the pattern portion 211 of the above are located on the line 1, and the enlarged pattern portion 211 imaged on the second imaging unit 220b. The center coordinates of the image (X ₄ , Y ₄ ), the center coordinates of the lens unit 221b of the second imaging unit 220b (0, L), and the center coordinates of the first lens unit 213 of the marker unit 210 (X, Y). When, it is possible to confirm that the actual space coordinates of the pattern portion 211 of the marker unit 210 to be confirmed by the second imaging unit 220b _(X 2, _{Y 2)} and is located on line 2. Here, (X ₃ , Y ₃ ) = (-fc', -u ₁ ), (X ₄ , Y ₄ ) = (-fc, L + u ₂ ) can be represented by (X ₁ , Y _1). ) And (X ₂ , Y ₂ ) can be expressed as in Equation 2.

The coordinates of the lines 1 and 2 as described above are arranged through Table 1 as follows.

Table 1 is a coordinate rearranging table located on the line 1 and the line 2 shown in FIG. 12, and the three coordinates (1), (2), (2) on the line 1 and the line 2 with reference to the above table 1. If two equations are created in 3) and the difference is calculated, it can be expressed as Equation 3.

Further, when two equations are created with the three coordinates (1), (2) and (4) on the line 1 and the line 2 and the difference is calculated, it can be expressed as the equation 4.

Further, if two equations are created with the three coordinates (1), (3), and (4) on the line 1 and the line 2, they can be expressed as equations 5 and 6.

Then, by substituting the mathematical formula 3 into the mathematical formula 4 and dividing both sides by cos θ, the tan θ can be obtained, and the tan θ can be expressed as in the mathematical formula 7.

On the other hand, if the θ values are known in Equations 5 and 6, the variables are only X and Y. Therefore, when the two equations are combined, X and Y, which are the coordinates of the first lens unit 213 of the marker unit 210, are calculated. The coordinates X and Y of the first lens unit 213 of the marker unit 210 can be expressed as in Equation 8.

<Example 3>
Since the optical tracking system according to the present embodiment is the same as the optical tracking system according to the first embodiment except for some contents for the marker unit, it relates to other components except for some contents related to the marker unit. A detailed description will be omitted.

FIG. 13 is a schematic view of an optical tracking system according to a third embodiment of the present invention.

Referring to FIG. 13, the optical tracking system according to this embodiment includes one marker unit 310, a first imaging unit 320 and a processor 330.

The marker unit 310 can include a pattern unit 311, first and second light sources 312a and 312b, and first and second lens units 313a and 313b.

A large number of pattern portions (not shown) are formed in the pattern portion 311 at regular intervals. Here, the pattern portion 311 corresponds to the first and second lens portions 313a and 313b, and can be formed in two as shown in FIG. 13, as shown in FIG. 14 described later. It can be formed into one.

The first and second light sources 312a and 312b are arranged behind the pattern portion 311 so as to be separated from each other by a predetermined time, and irradiate the pattern portion 311 with light.

The first and second lens portions 313a and 313b were arranged in front of the pattern portion 311 so as to be separated from each other by a predetermined distance, and were irradiated from the first and second light sources 312a and 312b and passed through the pattern portion 311. The light can be emitted to the imaging unit 320 in the form of parallel emission light.

Since the process of calculating the direction of the marker unit 310 of the optical tracking system according to the present embodiment is the same as that of the optical tracking system according to the first embodiment, the description thereof is omitted, and the space of the marker unit 310 is referred to with reference to FIG. Only the process in which the position is calculated by the processor 330 will be described with an example.

FIG. 14 is a drawing for explaining a process of calculating the spatial position of the marker unit by the processor of the optical tracking system according to the third embodiment of the present invention.

As shown in FIG. 14, assuming that the image coordinates formed on the imaging unit 320 are u ₁ and u ₂ , the pattern portion 311 passes through the center coordinates (X, Y) of the first lens portion 313a of the marker unit 310. The coordinates of the point where it meets, that is, the real space coordinates (X1, Y1) of the pattern unit 311 can be expressed as in Equation 9.

Further, the coordinates that pass the center coordinates (-sin θ1 + X, cos θ1 + Y) of the second lens portion 313b of the marker unit 310 and meet the pattern portion 311, that is, the real space coordinates (X ₂ , Y ₂ ) of the pattern portion 311 are shown in Equation 10. Can be expressed as.

On the other hand, as in the second embodiment, the coordinates on the line 1 and the line 2 are arranged through Table 2 as follows.

Table 2 is a coordinate rearranging table located on the line 1 and the line 2 shown in FIG. 10, and the three coordinates (2), (3), (3) on the line 1 and the line 2 are referred to with reference to the above table 2. If two equations are created and arranged in 4), X and Y can be expressed as Equation 11.

Further, when two equations are created with the three coordinates (1), (2) and (3) on the line 1 and the line 2 and the difference is calculated, it can be expressed as the equation 12.

Further, if two equations are created with the three coordinates (1), (2) and (4) on the line 1 and the line 2 and the difference is calculated, it can be expressed as the equation 13.

Further, if two equations are made with the three coordinates (1), (3), and (4) on the line 1 and the line 2, they can be expressed as equations 14 and 15.

On the other hand, when Equation 12 is substituted into Equation 13 and both sides are divided by cosθ, tanθ can be expressed as Equation 16.

Then, if the θ values are known in the mathematical formulas 14 and 15, the variables are only X and Y. Therefore, when the two equations are combined, the coordinates X and Y of the first lens unit 313a are expressed as the mathematical formula 17. obtain.

Further, since the coordinates of the first lens unit 313a are calculated by the mathematical formula 17, the coordinates (−sin θ1 + X, cos θ1 + Y) of the second lens unit (313b) can also be calculated.

<Example 4>
Since the optical tracking system according to the present embodiment is substantially the same as the optical tracking system according to the first embodiment except for the content in which the two imaging units and the two marker units are arranged, the imaging unit and the marker Detailed explanations of other components and contents except for some contents related to the arrangement of units will be omitted.

FIG. 15 is a schematic view of an optical tracking system according to a fourth embodiment of the present invention.

Referring to FIG. 15, the optical tracking system according to this embodiment includes first and second marker units 410a and 410b, first and second imaging units 420a and 420b, and a processor 430.

The first and second marker units 410a and 410b are attached to the target object at a predetermined interval, and the spatial position and direction between the first and second marker units 410a and 410b are already stored in the processor 430.

The first and second imaging units 420a and 420b receive the parallel emission light of the pattern portions 411a and 411b emitted from the first and second marker units 410a and 410b, respectively, and form an enlarged image. That is, the first imaging unit 420a receives the parallel emission light of the pattern portion 411a emitted from the first marker unit 410a to form an enlarged image, and the second imaging unit 420b forms the second marker. The parallel emission light of the pattern portion 411b emitted from the unit 410b is received to form an enlarged image.

The processor 430 is connected to the first and second imaging units 420a and 420b, and is imaged on the imaging units 420a and 420b and magnified by using the image of the pattern portions 411a and 411b. The spatial positions and directions of the marker units 410a and 410b are calculated.

FIG. 16 is a drawing for explaining a process of calculating the spatial position of the marker unit by the processor of the optical tracking system according to the fourth embodiment of the present invention.

As shown in FIG. 16, in the optical tracking system according to the present embodiment, the processor 430 calculates a vector from the center of the lens unit 421a of the first imaging unit 420a toward the center of the first lens unit 413a of the first marker unit 410a. After calculating the vector from the center of the lens portion 421b of the second imaging unit 420b toward the center of the second lens portion 413b of the second marker unit 410b, two of l _l and l _r are passed through the calculated two vectors. By creating a linear formula and calculating the intersection of two straight lines, the spatial positions of the first and second marker units 410a and 410b can be calculated.

<Example 5>
FIG. 17 is a schematic view of the optical tracking system according to the fifth embodiment of the present invention, and FIG. 18 is a drawing showing a marker unit according to the fifth embodiment of the present invention.

With reference to FIGS. 17 and 18, the optical tracking system according to this embodiment includes at least one light source 540, at least one marker unit 510, at least one imaging unit 520 and processor 530.

The at least one light source 540 is arranged so that light can be emitted toward the marker unit 510. For example, the light source 540 may be an LED (Light Emitting Diode). Here, it is desirable that the at least one light source 540 is arranged outside the marker unit 510.

The at least one marker unit 510 reflects the light emitted from the light source 540 so as to be emitted in the form of parallel emission light.

The marker unit 510 can include a ball lens 513 and a pattern portion 511 provided on the surface of the ball lens 513. Here, the pattern portion 511 can be provided on the entire surface of the ball lens 513. Unlike this, the pattern portion 511 can be provided only on a part of the surface of the ball lens 513.

The ball lens 513 reflects the light emitted from the light source 540 so that the imaging unit 520 can form an enlarged image of the pattern portion 511, and the image is formed in the form of parallel emission light. Discharge to the unit 520 side.

The at least one imaging unit 520 receives the parallel emission light emitted from the marker unit 510 and forms an enlarged image of the pattern portion 511.

For example, the imaging unit 520 receives the parallel emission light emitted from the marker unit 510 through the lens unit 521 and forms an image of the pattern unit 511 magnified by the parallel emission light on the sensor unit 522. It can be a camera.

The processor 530 compares the enlarged image of the pattern unit 511 imaged on the imaging unit 520 with the image of the reference pattern unit already stored in the processor 530, and the space of the marker unit 510. Calculate the position and direction.

More specifically, the processor 530 sets the position and size of the image of the pattern portion 511 imaged and enlarged by the imaging unit 520 to the reference position and size of the image of the reference pattern portion already stored. The spatial position of the marker unit 510 is calculated in comparison with the above, and the position of the pattern portion by region and the size of the pattern portion 511 of the enlarged pattern portion 511 and the reference pattern for each region of the image of the already stored pattern portion are calculated. The spatial position and direction of the target object can be calculated by calculating the direction of the marker unit 510 by comparing the position of the portion and the size of the reference pattern portion and calculating the spatial position and direction of the marker unit 510. it can.

The process of calculating the spatial position and direction of the target object by using the optical tracking system according to the fifth embodiment of the present invention will be described with reference to FIGS. 17 to 24.

FIG. 19 is a flowchart for explaining a process of tracking an object using the optical tracking system according to the fifth embodiment of the present invention.

Referring to FIGS. 17 to 19, in order to track an object using the optical tracking system according to the fifth embodiment of the present invention, the light source 540 is first operated to provide a marker unit 510, that is, a pattern portion 511. Light is emitted toward the ball lens 513 (S210).

The light emitted toward the marker unit 510 is reflected and parallel by the marker unit 510 provided with the pattern portion 511 on the surface of the ball lens 513 so that the image of the pattern portion 511 can be enlarged and imaged. It is emitted in the form of emitted light (S220).

The parallel emission light reflected and emitted by the ball lens 513 is incident on the imaging unit 520 to form an image of the enlarged pattern portion 511 (S230).

The process of forming an image of the enlarged pattern portion 511 (S230) will be described in more detail. The parallel emission light of the pattern portion 511 reflected and emitted by the ball lens 513 is the lens of the imaging unit 520. The parallel emission light of the pattern unit 511 that has passed through the unit 521 and passed through the lens unit 521 of the imaging unit 520 causes the sensor unit 522 to form an image of the enlarged pattern unit 511.

When the image of the enlarged pattern unit 511 is formed on the imaging unit 520 as described above, the processor 530 uses the image of the enlarged pattern unit 511 to determine the spatial position and direction of the marker unit 510. Calculate (S240).

The process of calculating the spatial position and direction of the marker unit 510 with reference to FIG. 20 will be described in more detail as follows.

FIG. 20 is a flowchart for explaining a process of calculating the spatial position and direction of the marker unit.

Referring to FIG. 20, in order to calculate the spatial position and direction of the marker unit 510 through the processor 530, an image of the pattern portion 511 imaged and enlarged on the imaging unit 520 through the processor 530 is used. The angle at which the marker unit 510 is rotated is calculated, and the direction of the marker unit 510 is calculated (S241).

As described above, when the rotated angle of the marker unit 510 is calculated by the processor 530, the image of the pattern portion 511 imaged and enlarged on the imaging unit 520 through the processor 530 and the marker unit 510 The spatial position of the marker unit 510 is calculated using the rotated angle of (S242).

Here, the spatial position and direction information of the imaging unit 520 is already stored in the processor 530.

The step (S241) for calculating the direction of the marker unit 510 will be described in more detail with reference to FIGS. 21 and 22 as follows.

FIG. 21 is a flowchart for explaining a process of calculating the direction of the marker unit, and FIG. 22 shows a process of calculating the direction of the target object using the optical tracking system according to the first embodiment of the present invention. It is a drawing to do.

Referring to FIG. 21, in order to calculate the direction of the marker unit 510, first, the position of the pattern portion 511 for each region of the image of the pattern portion 511 imaged and enlarged on the imaging unit 520 through the processor 530. And the change in the size of the pattern portion 511 is measured (S1410).

After measuring the change in the position of the pattern unit 511 for each area of the image of the pattern unit 511 and the size of the pattern unit 511, the reference pattern unit 511 for each area of the image of the pattern unit 511 already stored in the processor 530. Comparing the size of the position and reference pattern portion 511 with the changes in the position of the pattern portion 511 and the size of the pattern portion 511 for each region of the image of the pattern portion 511 imaged and enlarged by the imaging unit 520. By calculating the rotated angle of the marker unit 510, the direction of the marker unit 510 is calculated (S2411).

That is, as shown in FIG. 22, when the marker unit 510 rotates, the position and size of the pattern portion 511 of the image I ₁ of the pattern portion 511 imaged and enlarged by the imaging unit 520 also changes. , The position of the region-specific reference pattern portion 511 of the pattern portion image I ₂ already stored in the processor 530, the size of the reference pattern portion 511, and the image I _{1 of the} pattern portion imaged on the imaging unit 520. When the position of the pattern portion 511 for each region and the change in the size of the pattern portion 511 are compared, the rotated angle θ of the marker unit 510 can be calculated, so that the direction of the marker unit 510 can be changed. You will be able to calculate.

Next, the step (S242) for calculating the spatial position of the marker unit with reference to FIGS. 23 to 24d will be described in more detail as follows.

FIG. 23 is a flowchart for explaining the process of calculating the spatial position of the marker unit, and FIGS. 24a to 24d are drawings for explaining the process of calculating the spatial position of the marker unit.

With reference to FIGS. 23 to 24d, in order to calculate the spatial position of the marker unit 510, first, the position and size of the image of the pattern unit 511 imaged and enlarged on the imaging unit 520 through the processor 530. Measure (S2420).

After measuring the position and size of the image of the pattern unit 511, the reference position and size of the image of the pattern unit 511 already stored in the processor 530 and the image formed on the imaging unit 520 are enlarged. The position and size of the image of the pattern unit 511 are compared with each other through the processor 530, and the spatial position of the marker unit 510 is calculated (S2421).

FIG. 24a shows a reference position and a size in which an image of the pattern unit 511 is imaged on the imaging unit 520 when the marker unit 510 is already stored in the processor 530. As shown in FIG. 24b, when the separated distance D2 between the marker unit 510 and the imaging unit 520 is shorter than the reference distance D1, the reference of the image of the pattern unit 511 already stored in the processor 530. The image size A2 of the image of the pattern portion 511 enlarged from the size A1 is further imaged on the imaging unit 520. Therefore, the reference size A1 of the image of the pattern unit 511 and the image size A2 of the image of the pattern unit 511 imaged and enlarged by the imaging unit 520 are compared through the processor 530, and the marker unit 510 is compared. You will be able to calculate the spatial position.

On the other hand, although not shown in the drawing, when the separated distance D2 between the marker unit 510 and the imaging unit 520 is longer than the reference distance D1, the image of the pattern portion already stored in the processor 530 The image size A2 of the image portion 511 enlarged from the reference size A1 is formed smaller on the imaging unit 520.

Then, as shown in FIG. 24c, when the marker unit 510 is located below the reference position B1, the enlargement is made from the reference position (C1: see FIG. 24a) of the image of the pattern unit 511 already stored in the processor 530. The image of the patterned portion 511 is located at the upper part and is imaged on the imaging unit 520. Therefore, the reference position C1 of the image of the pattern unit 511 and the position C2 of the image of the pattern unit 511 imaged and enlarged by the imaging unit 520 are compared through the processor 530, and the spatial position of the marker unit 510 is compared. Will be able to be calculated.

On the other hand, although not shown in the drawing, when the marker unit 510 is located above the reference position B1, the enlarged pattern portion from the reference position C1 of the image of the pattern portion 511 already stored in the processor 530. The image of 511 is imaged on the imaging unit 520 so as to be located at the bottom.

Then, when the separated distance D2 between the marker unit 510 and the imaging unit 520 is different from the reference distance D1 and the marker unit 510 is not located at the reference position B1, it is already stored in the processor 530. The spatial position of the marker unit 510 is compared with the reference position C1 and the size A1 of the image of the pattern portion and the position C2 and the size A2 of the image of the pattern portion imaged and enlarged by the imaging unit 520. Can be calculated.

On the other hand, as shown in FIG. 24d, the distance D2 separated between the marker unit 510 and the imaging unit 520 is the same as the reference distance D1, and the marker unit 510 is located at the reference position B1. When only the direction of the marker unit 510 is changed by θ, the size A2 and the position C2 of the image of the enlarged pattern portion 511 imaged on the imaging unit 520 are already stored in the processor 530. It is calculated to be the same as the reference position C1 and the size A1 of the image of the pattern portion 511. Therefore, as the direction is described in step S2411 of the marker unit 510, the magnitude and changes in the position and pattern portion 511a of the enlarged image _{I 1} of the pattern portion 511 regional pattern portion 511a, already processor 530 The direction of the marker unit 510 by calculating the rotated angle of the marker unit 510 by comparing the position of the region-specific reference pattern portion 511a and the size of the reference pattern portion 511a of the stored pattern unit image I _2. Can be calculated.

As described above, in the optical tracking system according to the embodiment of the present invention, the parallel emission light of the pattern unit 511 is emitted from the marker unit 510 to form an image of the enlarged pattern unit 511 on the imaging unit 520. , The spatial position of the marker unit 510 is calculated using this. That is, the position accuracy of the marker unit 510 does not depend only on the resolving power of the imaging unit 520, and the distance of the target object to be measured by enlarging the image of the pattern unit 511 and forming an image on the imaging unit 520 is determined. Even if it is far away from the imaging unit 520, the spatial position and direction of the target object can be calculated without a decrease in accuracy.

Therefore, the optical tracking system according to the embodiment of the present invention can detect and track the accurate spatial position and direction of the target object regardless of the distance of the target object to be measured, so that the usable area can be greatly expanded. Not only that, the size of the marker unit 510 can be significantly reduced as compared with the conventional marker unit, so that the equipment can be miniaturized.

<Example 6>
The optical tracking system according to the sixth embodiment of the present invention will be described with reference to FIG. 25 as follows.

FIG. 25 is a drawing for explaining an optical tracking system according to a sixth embodiment of the present invention.

Referring to FIG. 25, the optical tracking system according to this embodiment can include at least one light source (not shown), marker units 610, first and second imaging units 620A, 620B, processor 630 and the like. ..

As shown in FIG. 25, in the optical tracking system according to the present embodiment, the first and second imaging units 620a and 620b are arranged around the marker unit 610 provided with the pattern portion 611 on the surface of the ball lens 613, and the processor. The 630 may be configured by being connected to the first and second imaging units 620a and 620b.

Therefore, the first and second imaging units 620a and 620b receive the parallel emission light emitted from the marker unit 610, respectively, to form an enlarged image of the pattern portion 611, for example, the imaging. The units 620a and 620b receive the parallel emission light emitted from the marker unit 610 through the lens units 621a and 621b, and receive an image of the pattern unit 611 enlarged by the parallel emission light, respectively, in the sensor units 622a and 622b. It can be a camera that forms an image on the lens.

The processor 630 compares the enlarged image of the pattern portion 611 imaged on the first and second imaging units 620a and 620b with the image of the reference pattern portion already stored, and the marker unit 610. Calculate the spatial position and direction of. Here, the spatial positions and directions of the first and second imaging units 620a and 620b and at least one light source are already stored in the processor 630.

<Example 7>
The optical tracking system according to the seventh embodiment of the present invention will be described with reference to FIG. 26 as follows.

FIG. 26 is a drawing for explaining an optical tracking system according to a seventh embodiment of the present invention.

Referring to FIG. 26, the optical tracking system according to this embodiment includes at least one light source (not shown), first to third marker units 710a, 710b, 710c, an imaging unit 720, a processor 730, and the like. be able to.

As shown in FIG. 26, in the optical tracking system according to the present embodiment, the first to third marker units 710a, 710b, 710c provided with the pattern portions 711a, 711b, 711c on the surface of the ball lenses 713a, 713b, 713c are provided. The light emitted from the light source is reflected by the first to third marker units 710a, 710b, and 710c and emitted in the form of parallel emission light, which is arranged on the target object at predetermined intervals, and the first to third marker units are emitted. The parallel emission light emitted by the 710a, 710b, and 710c is received by the imaging unit 720, and images of the enlarged pattern portions 711a, 711b, and 711c of the first to third marker units 710a, 710b, and 710c are displayed. The image will be formed.

The imaging unit 720 receives the parallel emission light emitted from the first to third marker units 710a, 710b, 710c through the lens unit 721 and magnifies the pattern portion 711a, 711b, 711c by the parallel emission light. Image can be formed on the sensor unit 722.

On the other hand, the processor 730 is an image of the enlarged pattern portions 711a, 711b, 711c of the first to third marker units 710a, 710b, 710c which are connected to the imaging unit 720 and imaged on the imaging unit 720. And the image of the reference pattern portion already stored are compared with each other, and the spatial positions and directions of the marker units 710a, 710b, and 710c are calculated. Here, the spatial positions and directions of the imaging unit 720 and the at least one light source are already stored in the processor 730.

In addition, the geometric information of the first to third marker units 710a, 710b, and 710c attached to the target object is already stored in the processor 730.

Here, the geometric information of the first to third marker units 710a, 710b, 710c is the length information of the straight lines L1, L2, L3 that virtually connect the marker units 710a, 710b, 710c adjacent to each other. , The angles θ1, θ2, and θ3 formed by the pair of virtual straight lines L1, L2, and L3 that are adjacent to each other can be information.

<Example 8>
The optical tracking system according to the eighth embodiment of the present invention will be described with reference to FIG. 27 as follows.

FIG. 27 is a drawing for explaining an optical tracking system according to an eighth embodiment of the present invention.

Referring to FIG. 27, the present embodiment is substantially the same as the seventh embodiment except that a second imaging unit 820b is further added.

That is, as shown in FIG. 27, in the optical tracking system according to the present embodiment, the first to third marker units 810a, 810b, 810c in which the pattern portions 811a, 811b, 811c are provided on the surfaces of the ball lenses 813a, 813b, 813c. Are attached to the target object at predetermined intervals, and the first and second imaging units 820a and 820b are arranged around the first to third marker units 810a, 810b and 810c, and the first and second imaging units 820a and 820b are arranged. The processor 830 is connected to the.

As a result, the light emitted from the light source is reflected by the first to third marker units 810a, 810b, 810c, and is received by the imaging units 820a, 820b in the form of parallel emission light, and the patterned portions 811a, 811b are enlarged. , The image of 811c is formed.

The imaging units 820a and 820b receive the parallel emission light emitted from the first to third marker units 810a, 810b and 810c through the lens portions 821a and 821b, and the pattern portion 811a enlarged by the parallel emission light. , 811b, 811c can be imaged by the sensor units 822a, 822b.

<Example 9>
Since the optical tracking system according to the present embodiment is substantially the same as the optical tracking system according to the fifth embodiment except for some contents of the marker unit, other parts except for some contents related to the marker unit are excluded. Detailed description of the components and contents will be omitted.

FIG. 28 is a drawing for explaining a marker unit according to a ninth embodiment of the present invention.

Referring to FIG. 28, the marker unit 910 of the optical tracking system according to this embodiment can include a pattern portion 911 and a fisheye lens 913.

The pattern portion 911 can reflect or transmit light emitted from at least one light source (not shown). That is, when the light source is arranged outside the marker unit 910, it is desirable that the pattern portion 911 is manufactured so as to be able to reflect the light emitted from the light source, and the light source is the light source. When arranged inside the marker unit 910 so as to be located behind the pattern portion 911, the pattern portion 911 is manufactured so as to allow light emitted from the light source to be transmitted. Is desirable.

The fisheye lens 913 is irradiated from the at least one light source and is reflected by the pattern portion 911 or passed through the pattern portion 911 to the imaging unit (not shown) side in the form of parallel emission light. It is arranged in front of the pattern portion 911 so that it can be released.

Here, it is desirable that the pattern portion 911 is arranged at the focal length of the fisheye lens 913.

<Example 10>
Since the optical tracking system according to this embodiment is substantially the same as the optical tracking system according to the first embodiment except for some contents of the marker unit, other configurations except for some contents related to the marker unit are made. Detailed description of the elements and contents will be omitted.

FIG. 29 is a drawing for explaining a marker unit according to a tenth embodiment of the present invention.

Referring to FIG. 29, the marker unit 1010 of the optical tracking system according to the present embodiment can include a pattern unit 1011, an objective lens 1013, a prism 1014, and the like.

The pattern portion 1011 can reflect or transmit light emitted from at least one light source (not shown). That is, when the light source is arranged outside the marker unit 1010, it is desirable that the pattern portion 1011 is manufactured so as to be able to reflect the light emitted from the light source, and the light source is the light source. When arranged inside the marker unit 1010 so as to be located at the rear portion of the pattern portion 1011, the pattern portion 1011 is manufactured so as to allow light emitted from the light source to be transmitted. Is desirable.

The objective lens 1013 is irradiated from at least one light source and reflected by the pattern unit 1011 or passed through the pattern unit 1011 to the imaging unit (not shown) side in the form of parallel emission light. It is arranged in the front portion of the pattern portion 1011 so that it can be released.

Here, it is desirable that the pattern portion 1011 is arranged at the focal length of the objective lens 1013.

The prism 1014 passes the parallel emission light that has passed through the objective lens 1013 to widen the angle of view of the parallel emission light, and then is incident on the imaging unit. Here, it is desirable that the prism 1014 is formed in a pyramid shape.

<Example 11>
FIG. 30 is a schematic view of the optical tracking system according to the eleventh embodiment of the present invention, and FIG. 31 is a drawing showing a marker unit according to the eleventh embodiment of the present invention.

With reference to FIGS. 30 and 31, the optical tracking system according to this embodiment includes at least one light source 1140, at least one marker unit 1110, at least one imaging unit 1120 and processor 1130.

The at least one light source 1140 is arranged so that light can be emitted toward the marker unit 1110. For example, the light source 1140 can be an LED (Light Emitting Diode). Here, it is desirable that the at least one light source 1140 is arranged outside the marker unit 1110.

The at least one marker unit 1110 can reflect the light emitted from the light source 1140 and emit it in the form of parallel emission light so that the imaging unit 1120 can image an enlarged image of the pattern portion 1111. To do so.

The marker unit 1110 may include a mirror unit 1113, a pattern unit 1111 and the like.

The mirror unit 1113 reflects the light emitted from at least one light source 1140 toward the marker unit 1110 toward the pattern unit 1111, and then rereflects the light reflected by the pattern unit 1111 to cause the at least one. It is emitted to one imaging unit 1120 side in a parallel light form. Here, the mirror portion 1113 may be a spherical or aspherical mirror. For example, a concave mirror that reflects light so that light can be collected at one point can be used for the mirror portion 1113.

The pattern portion 1111 is arranged at the focal length of the mirror portion 1113, and the light reflected and incident from the mirror portion 1113 is re-reflected toward the mirror portion 1113.

On the other hand, the marker unit 1110 can further include a first lens 1112.

The first lens 1112 may be arranged so as to be separated from the mirror portion 1113 by a focal length. That is, the first lens 1112 is arranged so as to be separated by the focal length of the mirror portion 1113 and the first lens 1112, and the light reflected by the mirror portion 1113 and emitted in the form of parallel emission is emitted. At least one imaging unit 1120 side is once again converted into a parallel emission light form and emitted.

On the other hand, the marker unit 1110 can further include a diaphragm 1114 provided in the mirror portion 1113. The aperture 1114 adjusts the amount of light emitted from the light source 1140 and incident on the mirror unit 1113, and adjusts the angle of view and resolution of the image of the enlarged pattern unit 1111 imaged on the imaging unit 1120. it can.

The at least one imaging unit 1120 receives the parallel emission light emitted from the marker unit 1110 and forms an enlarged image of the pattern portion 1111.

For example, the imaging unit 1120 receives the parallel emission light emitted from the marker unit 1110 through the lens unit 1121 and forms an image of the pattern unit 1111 magnified by the parallel emission light on the sensor unit 1122. It can be a camera.

The processor 1130 compares the enlarged image of the pattern unit 1111 imaged on the imaging unit 1120 with the reference pattern image already stored in the processor 1130, and the spatial position of the marker unit 1110 and the spatial position of the marker unit 1110. Calculate the direction.

More specifically, the processor 1130 compares the position and size of the image of the pattern unit 1111 imaged and enlarged by the imaging unit 1120 with the reference position and size of the already stored reference pattern image. Then, the spatial position of the marker unit 1110 is calculated, the position of the area-specific pattern of the enlarged pattern unit 1111 and the size of the pattern unit 1111, and the position and reference pattern of the area-specific reference pattern of the already stored pattern image. The spatial position and direction of the target object can be calculated by calculating the direction of the marker unit 1110 by comparing with the size of the marker unit 1110 and calculating the spatial position and direction of the marker unit 1110.

The process of calculating the spatial position and direction of the target object by using the optical tracking system according to the eleventh embodiment of the present invention will be described with reference to FIGS. 30 to 37.

FIG. 32 is a flowchart for explaining a process of tracking an object using the optical tracking system according to the eleventh embodiment of the present invention.

Referring to FIGS. 30 to 32, in order to track an object using the optical tracking system according to the eleventh embodiment of the present invention, the light source 1140 is first operated, and the marker unit 1110, that is, the pattern portion 1111 is provided. Light is emitted toward the mirror portion 1113 (S310).

The light emitted toward the marker unit 1111 is reflected by the marker unit 1110 provided with the pattern unit 1111 at the focal length of the mirror unit 1113 so that the image of the pattern unit 1111 can be enlarged and imaged. It is emitted in the form of parallel emission light (S320).

More specifically, the light emitted toward the marker unit 1110 is reflected by the mirror unit 1113, collected at one point on the pattern unit 1111, and then reflected again by the pattern unit 1111 and the mirror unit 1113. The light emitted in the parallel light form and emitted by the mirror unit 1113 in the parallel emission form is converted into the parallel emission light form again through the first lens 1112 and emitted.

The parallel emission light reflected and emitted by the marker unit 1110 is incident on the imaging unit 1120 to form an image of the enlarged pattern portion 1111 (S330).

The process of forming an image of the enlarged pattern portion 1111 (S330) will be described in more detail. The parallel emission light of the pattern portion 1111 reflected and emitted by the marker unit 1110 is the lens of the imaging unit 1120. The parallel emission light of the pattern unit 1111 that has passed through the lens unit 1121 of the imaging unit 1120 will form an image of the enlarged pattern unit 1111 on the sensor unit 1122.

When the image of the enlarged pattern portion 1111 is formed on the imaging unit 1120, the aperture 1114 is operated after confirming the image of the enlarged pattern portion 1111 formed on the imaging unit 1120. The angle of view and the resolution of the image of the enlarged pattern portion 1111 imaged on the imaging unit 1120 are adjusted by adjusting the amount of light incident on the mirror portion 1113 (S340).

When the image of the enlarged pattern portion 1111 whose angle of view and resolution are adjusted by adjusting the amount of light incident on the mirror portion 1113 by the diaphragm 1114 is formed on the imaging unit 1120, the processor 1130 is described. The spatial position and direction of the marker unit 1110 are calculated using the image of the enlarged pattern portion 1111 whose angle of view and resolution are adjusted (S350).

The process of calculating the spatial position and direction of the marker unit 1110 (S150) with reference to FIG. 33 will be described in more detail as follows.

FIG. 33 is a flowchart for explaining a process of calculating the spatial position and direction of the marker unit.

Referring to FIG. 33, in order to calculate the spatial position and direction of the marker unit 1110 through the processor 1130, an image of the pattern portion 1111 imaged and enlarged by the imaging unit 1120 through the processor 1130 is used. The angle at which the marker unit 1110 is rotated is calculated, and the direction of the marker unit 1110 is calculated (S351).

When the rotated angle of the marker unit 1110 is calculated by the processor 1130 as described above, the image of the pattern portion 1111 imaged and enlarged on the imaging unit 1120 through the processor 1130 and the marker unit 1110 The spatial position of the marker unit 1110 is calculated using the rotated angle (S352).

Here, the spatial position and direction information of the imaging unit 1120 is already stored in the processor 1130.

The step (S351) for calculating the direction of the marker unit 1110 with reference to FIGS. 34 and 35 will be described in more detail as follows.

FIG. 34 is a flowchart for explaining the process of calculating the direction of the marker unit, and FIG. 35 explains the process of calculating the direction of the target object using the optical tracking system according to the eleventh embodiment of the present invention. It is a drawing to do.

Referring to FIG. 34, in order to calculate the direction of the marker unit 1110, first, the position of the pattern portion 1111 for each region of the image of the pattern portion 1111 imaged and enlarged on the imaging unit 1120 through the processor 1130. And the change in the size of the pattern portion 1111 is measured (S3510).

After measuring the change in the area-specific pattern position and pattern size of the image of the pattern unit 1111, the area-specific reference pattern position and reference pattern size of the image of the pattern unit 1111 already stored in the processor 1130. The rotation angle of the marker unit 1110 is calculated by comparing the position of the pattern for each region and the change in the size of the pattern in the image of the pattern unit 1111 imaged and enlarged on the imaging unit 1120. Therefore, the direction of the marker unit 1110 is calculated (S3511).

That is, as shown in FIG. 35, when the marker unit 1110 rotates, the position and size of the pattern portion 1111 of the image I ₁ of the pattern portion 1111 imaged and enlarged by the imaging unit 1120 also changes. Therefore, the position and the size of the reference pattern for each region of the pattern image I ₂ already stored in the processor 1130, the position of the pattern for each region of the pattern image I ₁ imaged in the imaging unit 1120, and When the change in the size of the pattern is compared, the rotated angle of the marker unit 1110 can be calculated, so that the direction of the marker unit 111 can be calculated.

Next, the step (S352) of calculating the spatial position of the marker unit with reference to FIGS. 36 and 37 will be described in more detail as follows.

FIG. 36 is a flowchart for explaining the process of calculating the spatial position of the marker unit, and FIGS. 37a to 37d are drawings for explaining the process of calculating the spatial position of the marker unit.

With reference to FIGS. 36 to 37d, in order to calculate the spatial position of the marker unit 1110, first, the position and size of the image of the pattern portion 1111 imaged and enlarged on the imaging unit 1120 through the processor 1130. Measure (S3520).

After measuring the position and size of the image of the pattern unit 1111, the reference position and size of the image of the pattern unit 1111 already stored in the processor and the pattern imaged and enlarged by the imaging unit 1120. The position and size of the image of unit 1111 are compared with each other through the processor 1130, and the spatial position of the marker unit 1110 is calculated (S3521).

FIG. 37a shows a reference position and size in which an image of the pattern unit 1111 is imaged on the imaging unit 1120 when the marker unit 1110 is already stored in the processor 1130. As shown in FIG. 37b, when the separated distance D2 between the marker unit 1110 and the imaging unit 1120 is shorter than the reference distance D1, the reference of the image of the pattern unit 1111 already stored in the processor 1130. The size A2 of the image of the pattern unit 1111 enlarged from the size A1 is further imaged on the imaging unit 1120. Therefore, the reference size A1 of the image of the pattern unit 1111 and the image size A2 of the image of the pattern unit 1111 imaged and enlarged by the imaging unit 1120 are compared through the processor 1130, and the marker unit 1110 is compared. You will be able to calculate the spatial position.

On the other hand, although not shown in the drawing, when the separated distance D2 between the marker unit 1110 and the imaging unit 1120 is longer than the reference distance D1, the reference size of the pattern image already stored in the processor 1130. The image size A2 of the pattern portion 1111 enlarged from the A1 is formed smaller on the imaging unit 1120.

Then, as shown in FIG. 37c, when the marker unit 1110 is located below the reference position B1, the enlargement is made from the reference position (C1: see FIG. 37a) of the image of the pattern unit 1111 already stored in the processor 1130. The image of the pattern portion 1111 is located at the upper part and is imaged on the imaging unit 1120. Therefore, the reference position C1 of the image of the pattern unit 1111 and the position C2 of the image of the pattern unit 1111 imaged and enlarged by the imaging unit 1120 are compared through the processor 1130, and the spatial position of the marker unit 1110 is compared. Will be able to be calculated.

On the other hand, although not shown in the drawing, when the marker unit 1110 is located on the reference position B1, the pattern portion 1111 enlarged from the reference position C1 of the image of the pattern portion 1111 already stored in the processor 1130. Is imaged on the imaging unit 1120 so that the image of is located at the bottom.

When the separated distance D2 between the marker unit 1110 and the imaging unit 1120 is different from the reference distance D1 and the marker unit 1110 is not located at the reference position B1, it is already stored in the processor 1130. The spatial position of the marker unit 1110 is calculated by comparing the reference position C1 and the size A1 of the pattern image with the position C2 and the size A2 of the pattern image imaged and enlarged by the imaging unit 1120. Can be done.

On the other hand, as shown in FIG. 37d, the separated distance D2 between the marker unit 1110 and the imaging unit 1120 is the same as the reference distance D1, and the marker unit 1110 is located at the reference position B1. When only the direction of the marker unit 1110 is changed by θ, the size A2 and the position C2 of the image of the enlarged pattern portion 1111 imaged on the imaging unit 1120 are already stored in the processor 1130. It is calculated to be the same as the reference position C1 and the size A1 of the image of the pattern portion 1111. Therefore, the direction of the marker unit 1110 as described in step S3511, the position and the size change of the pattern 1111a of the enlarged pattern area by pattern 1111a of the image _{I 1} of 1111, already stored in the processor 1130 The direction of the marker unit 1110 can be calculated by comparing the position of the region-specific reference pattern 1111a and the size of the reference pattern 1111a of the image I ₂ of the pattern, and calculating the rotated angle of the marker unit 1110. ..

As described above, in the optical tracking system according to the embodiment of the present invention, the parallel emission light of the pattern unit 1111 is emitted from the marker unit 1110 to form an image of the enlarged pattern unit 1111 on the imaging unit 1120. , The spatial position of the marker unit 1110 is calculated using this. That is, the position accuracy of the marker unit 1110 does not depend only on the resolution of the imaging unit 1120, and the distance of the target object to be measured is measured by enlarging the image of the pattern unit 1111 and forming an image on the imaging unit 1120. Can calculate the spatial position and orientation of the object without loss of accuracy, even if is far away from the imaging unit 1120.

Therefore, the optical tracking system according to the embodiment of the present invention can detect and track the accurate spatial position and direction of the target object regardless of the distance of the target object to be measured, and thus greatly expand the usable area. Not only that, the size of the marker unit 1110 can be significantly reduced as compared with the conventional marker unit, so that the equipment can be miniaturized.

On the other hand, the amount of light emitted from the light source 1140 and incident on the mirror unit 1113 of the marker unit 1110 is adjusted, and the image of the enlarged pattern unit 1111 reflected by the mirror unit 1113 and imaged on the imaging unit 1120. Since the angle and resolution of the image can be adjusted, there is an advantage that the spatial position and direction of the target object can be detected and tracked more accurately.

Although the detailed description of the present invention described above has been described with reference to desirable embodiments of the present invention, a person skilled in the art or a person having ordinary knowledge in the relevant technical field can request a patent described later. It can be understood that the present invention can be variously modified and modified without departing from the idea and technical domain of the present invention described in the scope of.

Claims (8)

How the optical tracking system works
The marker unit of the optical tracking system attached to the target object passes through the pattern portion or emits light reflected by the pattern portion so that the image of the pattern portion can be enlarged and imaged. Steps and
The first imaging unit of the optical tracking system receives the light that has passed through the pattern portion emitted from the marker unit or is reflected by the pattern portion to form an image of the first enlarged pattern portion. Steps and
A step in which the processor of the optical tracking system calculates the direction of the marker unit using the image of the first enlarged pattern portion, and
Only including,
The marker unit reflects light emitted from at least one light source through a ball lens provided with a pattern portion on the surface and emits it in the form of parallel emission light.
How the optical tracking system works. The step of calculating the direction of the marker unit is
The operation of the optical tracking system according to claim 1, wherein the processor calculates the angle at which the marker unit is rotated using the image of the first enlarged pattern portion, and calculates the direction of the marker unit. Method. The step of calculating the direction of the marker unit is
A step in which the processor measures the position of the pattern portion for each region of the image of the first enlarged pattern portion, and
The position of the region-specific reference pattern portion of the image of the pattern portion already stored in the processor was compared with the position of the region-specific pattern portion of the image of the first enlarged pattern portion, and the marker unit was rotated. Steps to calculate the angle and
2. The method of operating the optical tracking system according to claim 2. The second imaging unit of the optical tracking system receives the light that has passed through the pattern portion emitted from the marker unit or is reflected by the pattern portion to form an image of the second enlarged pattern portion. Steps and
A step in which the processor calculates the spatial position of the marker unit using the image of the first enlarged pattern portion and the image of the second enlarged pattern portion.
The method of operating the optical tracking system according to claim 1, further comprising. How the optical tracking system works
The marker unit of the optical tracking system attached to the target object passes through the pattern portion or emits light reflected by the pattern portion so that the image of the pattern portion can be enlarged and imaged. Steps and
The first imaging unit of the optical tracking system receives the light that has passed through the pattern portion emitted from the marker unit or is reflected by the pattern portion to form an image of the first enlarged pattern portion. Steps and
A step in which the processor of the optical tracking system calculates the direction of the marker unit using the image of the first enlarged pattern portion, and
Including
The marker unit is irradiated from at least one light source and passes through the pattern portion, or the light reflected by the pattern portion is passed through the objective lens and emitted in the form of parallel emission light, and then the angle of view is passed through the prism. Emit different parallel emission light,
How the optical tracking system works. How the optical tracking system works
The marker unit of the optical tracking system attached to the target object passes through the pattern portion or emits light reflected by the pattern portion so that the image of the pattern portion can be enlarged and imaged. Steps and
The first imaging unit of the optical tracking system receives the light that has passed through the pattern portion emitted from the marker unit or is reflected by the pattern portion to form an image of the first enlarged pattern portion. Steps and
A step in which the processor of the optical tracking system calculates the direction of the marker unit using the image of the first enlarged pattern portion, and
Including
The marker unit reflects light emitted from at least one light source through a mirror portion provided with a pattern portion and emits it in the form of parallel emission light.
How the optical tracking system works. In the optical tracking system
A marker unit that is attached to an object and emits light that passes through the pattern portion or is reflected by the pattern portion so that the image of the pattern portion can be magnified and imaged.
A first imaging unit that passes through the pattern portion emitted from the marker unit or receives light reflected by the pattern portion to form an image of the first enlarged pattern portion.
A processor that calculates the direction of the marker unit using the image of the first enlarged pattern portion, and
Including
The marker unit reflects light emitted from at least one light source through a ball lens provided with a pattern portion on the surface and emits it in the form of parallel emission light.
Optical tracking system. It further includes a second imaging unit that passes through the pattern portion emitted from the marker unit and receives the light reflected by the pattern portion to form an image of the second enlarged pattern portion.
The optical tracking system according to claim 7, wherein the processor calculates the spatial position of the marker unit by using the image of the first enlarged pattern portion and the image of the second enlarged pattern portion.